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Characterization of the damage produced by high-energy implantations into silicon by the thermal wave and RBS/channeling techniques

✍ Scribed by G.S. Sandhu; M. Anjum; S. Cherekdjian; B.K. Patnaik; N.R. Parikh; M.L. Swanson


Book ID
113281517
Publisher
Elsevier Science
Year
1991
Tongue
English
Weight
434 KB
Volume
59-60
Category
Article
ISSN
0168-583X

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