Characterization of TBP containing polysiloxane membrane/insulator/semiconductor structures for hexavalent chromium detection
✍ Scribed by A. Zazoua; R. Kherrat; M.H. Samar; A. Errachid; N. Jaffrezic-Renault; F. Bessueille; D. Léonard
- Publisher
- Elsevier Science
- Year
- 2008
- Tongue
- English
- Weight
- 649 KB
- Volume
- 28
- Category
- Article
- ISSN
- 0928-4931
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✦ Synopsis
A hexavalent chromium-sensitive EMIS sensor (electrolyte membrane insulator semiconductor sensor) is prepared by deposition of a tributylphosphate (TBP) ionophore-containing siloprene membrane on a Si/SiO 2 /Si 3 N 4 structure. The developed EMIS sensor was studied by means of impedance spectroscopy, capacitance-voltage, X-ray photoelectron spectrometry and FT-IR spectroscopy. From the flat-band shift of the EMIS structure, the nersntian response to the anionic species Cr 2 O 7 -was demonstrated. The linear range of detection is 10 -4 M to 10 -1 M and the detection limit is 10 -5 M. Sulfate and chloride anions are shown not to be interfering whereas carbonate ions present a pK pot equal to 0.19.