✦ LIBER ✦
Characterization of porous structure in ultra-low-κ dielectrics by depositing thin conductive cap layers
✍ Scribed by F Iacopi; Zs Tökei; M Stucchi; S.H Brongersma; D Vanhaeren; K Maex
- Publisher
- Elsevier Science
- Year
- 2003
- Tongue
- English
- Weight
- 415 KB
- Volume
- 65
- Category
- Article
- ISSN
- 0167-9317
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✦ Synopsis
A new methodology to characterize the porous structure of mesoporous dielectrics is presented. The technique is based on the evaluation of the degree of continuity of thin Ta(N) cap layers deposited by physical vapour deposition on top of blanket dielectric films. various ultra-low-k films prepared by completely different techniques have been investigated, showing that a clear dependence can be established between the increase in sheet resistance of the conductive cap layer and the amount of open pores at the surface of the dielectric films.