✦ LIBER ✦
Characterization of PECVD deposited silicon oxynitride thin films: S P Speakman et al,Vacuum,38, 1988, 183–188
- Publisher
- Elsevier Science
- Year
- 1989
- Tongue
- English
- Weight
- 153 KB
- Volume
- 39
- Category
- Article
- ISSN
- 0042-207X
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