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Characterization of nitrogen distribution profiles in fcc transition metal nitrides by means of Tc measurements

✍ Scribed by Walter Lengauer


Book ID
104592468
Publisher
John Wiley and Sons
Year
1990
Tongue
English
Weight
657 KB
Volume
15
Category
Article
ISSN
0142-2421

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✦ Synopsis


Abstract

The suitability of characterizing the nitrogen distributions in near‐surface regions of compact samples of TiN, ZrN, HfN, VN and NbN by means of a series of inductive T~c~ measurements with successive etching was investigated. The distribution profiles could be determined for TiN, ZrN and VN with an accuracy exceeding that of established microanalytical tools. One problem encountered in the characterization process was the non‐isotropic removal of layers. For HfN and NbN, nitrogen profile measurements were not possible because of the intrinsic T~c~ behaviour.