Characterization of highly boron-doped Si, Si1 − xGex and Ge layers by high-resolution transmission electron microscopy

✍ Scribed by H.H. Radamson; K.B. Joelsson; W.-X. Ni; L. Hultman; G.V. Hansson

• Publisher: Elsevier Science
• Year: 1995
• Tongue: English
• Weight: 304 KB
• Volume: 157
• Category: Article
• ISSN: 0022-0248
• DOI: 10.1016/0022-0248(95)00375-4