Characterization of epitaxial GaAs MOS capacitors using atomic layer-deposited TiO2/Al2O3gate stack: study of Ge auto-doping and p-type Zn doping

✍ Scribed by Goutam Kumar Dalapati; Terence Kin Shun Wong; Yang Li; Ching Kean Chia; Anindita Das; Chandreswar Mahata; Han Gao; Sanatan Chattopadhyay; Manippady Krishna Kumar; Hwee Leng Seng; Chinmay Kumar Maiti; Dong Zhi Chi

• Book ID: 115021306
• Publisher: Springer-Verlag
• Year: 2012
• Tongue: English
• Weight: 914 KB
• Volume: 7
• Category: Article
• ISSN: 1931-7573
• DOI: 10.1186/1556-276x-7-99