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Characteristics of silicon nitride after O/sub 2/ plasma surface treatment for pH-ISFET applications

✍ Scribed by Li-Te Yin; Jung-Chuan Chou; Wen-Yaw Chung; Tai-Ping Sun; Shen-Ken Hsiung


Book ID
114531045
Publisher
IEEE
Year
2001
Tongue
English
Weight
124 KB
Volume
48
Category
Article
ISSN
0018-9294

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