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Characteristics of silicon doped low-energy ion implantation : K. E. Manchester and C. B. Sibley, Trans. Metall. Soc. AIME, 236, March (1966), p. 379


Publisher
Elsevier Science
Year
1967
Tongue
English
Weight
195 KB
Volume
6
Category
Article
ISSN
0026-2714

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