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Characteristics of PECVD grown tungsten nitride films as diffusion barrier layers for ULSI DRAM applications

✍ Scribed by Byung Lyul Park; Dae-Hong Ko; Young Sun Kim; Jung Min Ha; Young Wook Park; Sang In Lee; Hyeon-Deok Lee; Myoung Bum Lee; U. In Chung; Young Bum Koh; Moon Yong Lee

Book ID: 107457482
Publisher: Springer US
Year: 1997
Tongue: English
Weight: 929 KB
Volume: 26
Category: Article
ISSN: 0361-5235
DOI: 10.1007/s11664-997-0096-6

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