Characteristic performance of radio-frequency (RF) plasma heating using inverter RF power supplies

Study of spiral inductors using Cu/low-k

Study of spiral inductors using Cu/low-k interconnect for high-performance radio-frequency integrated circuit (RF-IC) applications

✍ Yo-Sheng Lin; Hum-Ming Hsu 📂 Article 📅 2002 🏛 John Wiley and Sons 🌐 English ⚖ 212 KB

## Abstract Spiral inductors with various turn numbers fabricated with the use of leading‐edge 0.13‐μm mixed‐signal/RF CMOS technology with 193‐nm lithography and Cu/low‐k interconnect are described in this article. It is shown that quality (Q) factor decreased and increased with increasing tempera