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Characteristic features of the accumulation of vacancy-and interstitial-type radiation defects in dislocation-free silicon with different oxygen contents

✍ Scribed by I. I. Kolkovskii; V. V. Luk’yanitsa


Book ID
110119648
Publisher
Springer
Year
1997
Tongue
English
Weight
125 KB
Volume
31
Category
Article
ISSN
1063-7826

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