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Change in properties of a two-component diffusion coating in diffusion resorption

✍ Scribed by V. S. Pavlina; V. I. Astashkin

Publisher
Springer
Year
1984
Tongue
English
Weight
266 KB
Volume
20
Category
Article
ISSN
1573-885X

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## Abstract Diffusion processes play a key role in the fabrication of semiconductor devices. For a long time the underlying mechanisms were thought to be analogous to those in metals, based on vacancies as thc dominant lattice defects in thermal equilibrium. From the mid‐sixties onwards it became c