Carrier gas and ion beam parameter effects on the structure and properties of a-C:H/SiOx films deposited employing closed drift ion beam source

✍ Scribed by Asta Tamulevičienė; Šarūnas Meškinis; Vitoldas Kopustinskas; Sigitas Tamulevičius

• Book ID: 113823679
• Publisher: Elsevier Science
• Year: 2012
• Tongue: English
• Weight: 577 KB
• Volume: 282
• Category: Article
• ISSN: 0168-583X
• DOI: 10.1016/j.nimb.2011.08.064