✦ LIBER ✦
Carbon Trapped in Thin Oxide Films Produced during Polishing of Semiconductor Silicon in the System HF/HNO3/Carboxylic Acid
✍ Scribed by Prof. Dr. Robert B. Heimann
- Publisher
- John Wiley and Sons
- Year
- 1987
- Tongue
- German
- Weight
- 397 KB
- Volume
- 59
- Category
- Article
- ISSN
- 0009-286X
No coin nor oath required. For personal study only.