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Breaking the feature sizes down to sub-22 nm by plasmonic interference lithography using dielectric-metal multilayer

✍ Scribed by Yang, Xuefeng; Zeng, Beibei; Wang, Changtao; Luo, Xiangang


Book ID
115412266
Publisher
Optical Society of America
Year
2009
Tongue
English
Weight
213 KB
Volume
17
Category
Article
ISSN
1094-4087

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