✦ LIBER ✦
Bottom-oxide scaling for thin nitride/oxide interpoly dielectric in stacked-gate nonvolatile memory cells
✍ Scribed by Mori, S.; Sakagami, E.; Kaneko, Y.; Ohshima, Y.; Arai, N.; Yoshikawa, K.
- Book ID
- 114534475
- Publisher
- IEEE
- Year
- 1992
- Tongue
- English
- Weight
- 964 KB
- Volume
- 39
- Category
- Article
- ISSN
- 0018-9383
No coin nor oath required. For personal study only.