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Boron redistribution during reactive diffusion in Ni–Si contacts

✍ Scribed by O. Cojocaru-Mirédin; C. Perrin-Pellegrino; D. Mangelinck; D. Blavette

Book ID: 104052410
Publisher: Elsevier Science
Year: 2010
Tongue: English
Weight: 870 KB
Volume: 87
Category: Article
ISSN: 0167-9317
DOI: 10.1016/j.mee.2009.06.018

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