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Boron diffusion effects from p+ polysilicon gate in thin thermal oxide and plasma nitrided oxide

✍ Scribed by B. Piot; K. Barla; B. Garcin; A. Straboni


Book ID
103598471
Publisher
Elsevier Science
Year
1991
Tongue
English
Weight
186 KB
Volume
15
Category
Article
ISSN
0167-9317

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