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Blue-shifted stimulated emission from ZnO films deposited on SiO2 by atomic layer deposition

✍ Scribed by Ming Chih Lin; Mong-Kai Wu; Miin-Jang Chen; Jer-Ren Yang; Makoto Shiojiri

Book ID
113784740
Publisher
Elsevier Science
Year
2012
Tongue
English
Weight
618 KB
Volume
135
Category
Article
ISSN
0254-0584

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## Abstract By using remote plasma atomic layer deposition (ALD), ruthenium thin films were deposited on SiO~2~ using bis(ethylcyclopentadienyl)ruthenium [Ru(EtCp)~2~] as a Ru precursor and an ammonia plasma as a reactant. Different plasma treatments were applied, and the best results were obtained