Bilayer resist based on wet silylation (CARL process) for e-beam lithography

✍ Scribed by R. Leuschner; E. Schmidt; H. Ohlmeyer; R. Sezi; M. Irmscher

• Book ID: 103599142
• Publisher: Elsevier Science
• Year: 1995
• Tongue: English
• Weight: 792 KB
• Volume: 27
• Category: Article
• ISSN: 0167-9317
• DOI: 10.1016/0167-9317(94)00129-i