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Behavior of the Thermal Equilibrium in Reactively Sputtered a–Si1 −x Gex: H Alloy Films Studied by Conductivity and Capacitance–Voltage Measurements

✍ Scribed by Wang, Yinyue ;Zhang, Fangqing ;Chen, Guanghua


Publisher
John Wiley and Sons
Year
1990
Tongue
English
Weight
272 KB
Volume
121
Category
Article
ISSN
0031-8965

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