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Behavior of recoiled oxygen in through-oxide arsenic-implanted silicon

✍ Scribed by T. Izumi; T. Matsumori; T. Hirao; Y. Yaegashi; G. Fuse; K. Inoue


Publisher
Elsevier Science
Year
1983
Weight
438 KB
Volume
209-210
Category
Article
ISSN
0167-5087

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