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Behavior of dislocations due to thermal shock and critical shear stress of Si in Czochralski crystal growth

✍ Scribed by Toshinori Taishi; Keigo Hoshikawa; Yutaka Ohno; Ichiro Yonenaga


Publisher
Elsevier Science
Year
2009
Tongue
English
Weight
340 KB
Volume
404
Category
Article
ISSN
0921-4526

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