Barrier oxide film vs. salt layer formation on bismuth in tartaric acid solutions
β Scribed by M. Bojinov; I. Kanazirski; A. Girginov
- Book ID
- 103065903
- Publisher
- Elsevier Science
- Year
- 1995
- Tongue
- English
- Weight
- 750 KB
- Volume
- 40
- Category
- Article
- ISSN
- 0013-4686
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β¦ Synopsis
The anodic oxidation of bismuth metal in aqueous tartaric acid solutions is studied using electrochemical and photoelectrochemical techniques. The oxidation process comprises four stages: active anodic dissolution, primary passivation by a semiconductor oxide layer formation, secondary passivation due to salt layer formation at the oxide film/electrolyte interface and further growth of the oxide sublayer by a high-field transport mechanism. The chemical nature of the salt film was determined by ex-situ X-ray diffraction to be very close to normal bismuth tartrate Bi&,H,O&.6H,O.
Electrophysical characteristics of the oxide sublayer point to its identification with Bi,O, .
π SIMILAR VOLUMES
The anodic film studied was formed on Pb + 9at.%Bi at 0.9V (vs. Hg/Hg,S03 in 4.5 M H, SO, solution (25Β°C). The change of the phase composition of the anodic film during reduction at -0.91 V (vs. Hg/Hg,SO,) (slightly more positive than that of the reduction potential of PbSO,) was determined by X-ray
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