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Backscattered electron contrast on cross sections of interfaces and multilayers in the scanning electron microscope

✍ Scribed by A Konkol; G.R Booker; P.R Wilshaw


Publisher
Elsevier Science
Year
1995
Tongue
English
Weight
470 KB
Volume
58
Category
Article
ISSN
0304-3991

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The lithographic effect of electron beam in line exposures in scanning electron micruicopy (SEM) on poly(methy1 methacrylate) (PMMA) was evaluated using the line width in a film deposited on a silicium substrate and from the line profiles in a PMMA plate. It was found that the effect of the dose on