B diffusion and activation phenomena during post-annealing of C co-implanted ultra-shallow junctions

✍ Scribed by M. Di Marino; E. Napolitani; M. Mastromatteo; G. Bisognin; D. De Salvador; A. Carnera; S. Mirabella; G. Impellizzeri; F. Priolo; H. Graoui; M.A. Foad

• Publisher: Elsevier Science
• Year: 2006
• Tongue: English
• Weight: 143 KB
• Volume: 253
• Category: Article
• ISSN: 0168-583X
• DOI: 10.1016/j.nimb.2006.10.011