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Automation of a Mass Flow Controller for Application in Time-Multiplex SF6+CH4 Plasma Etching of Silicon

✍ Scribed by L.L. Tezani; R.S. Pessoa; R.S. Moraes; H.S. Medeiros; C.A. Martins; H.S. Maciel; G. Petraconi Filho; M. Massi; A. S. da Silva Sobrinho


Book ID
115554942
Publisher
John Wiley and Sons
Year
2012
Tongue
English
Weight
490 KB
Volume
52
Category
Article
ISSN
0005-8025

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