Automatic thermal cycling apparatus
โ Scribed by S. Basavaiah; S.J. Singer
- Publisher
- Elsevier Science
- Year
- 1978
- Tongue
- English
- Weight
- 422 KB
- Volume
- 18
- Category
- Article
- ISSN
- 0011-2275
No coin nor oath required. For personal study only.
โฆ Synopsis
Stability under a large number ol thermal cycles between 300" K and 4.2~' K is an essential requirement/or Josephson and other superconductive thin film devices. An apparatus is described here using the exchange gas principle to sublect such devices to repeated thermal cycles automatically, Through a careful design, liquid helium loss per cycle is kept to a very minimum of 0.6 litres without samples and 1.5 litres with a load o/ 10, l " diameter 2Orals thick, silicon wafers. Samples can be cycled between any two temperatures/n the range of 300" K and 4.5~' K by simple/ront panel settings. The cooling and warming rates are adlustable over a wtde range, Built m safety features, an important consideratron, allow the system to be, operated continuously unattended, except for the refill/ng o/ the dewar, over a period of days and weeks.
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