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Auto-correlation function analysis of amorphous interlayers in Ti/Si systems

โœ Scribed by L.J. Chen; S.L. Cheng; S.M. Chang; H.Y. Huang

Book ID
104420528
Publisher
Elsevier Science
Year
2001
Tongue
English
Weight
178 KB
Volume
4
Category
Article
ISSN
1369-8001

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โœฆ Synopsis

High-resolution transmission electron microscopy (HRTEM) in conjunction with auto-correlation function (ACF) analysis was utilized to determine the structure of the amorphous TiSi x layer formed in the initial stage prior to the formation of crystalline silicides. Enhanced formation of C54-TiSi 2 on (0 0 1) Si by tensile stress and/or high-temperature sputtering was found. The present work strongly suggested that the presence of a high density of silicide crystallites in the amorphous TiSi x layer leads to the favorable TiSi 2 formation.

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