✦ LIBER ✦
Attenuated phase shifting masks in combination with off-axis illumination: a way towards quarter micron DUV lithography for random logic applications
✍ Scribed by K. Ronse; R. Pforr; K.H. Baik; R. Jonckheere; L. Van den hove
- Publisher
- Elsevier Science
- Year
- 1994
- Tongue
- English
- Weight
- 610 KB
- Volume
- 23
- Category
- Article
- ISSN
- 0167-9317
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