Atomically flat, ultrathin-SiO2/Si(001)interface formation by UHV heating

✍ Scribed by Masaaki Niwa; Kenji Okada; Robert Sinclair

• Publisher: Elsevier Science
• Year: 1996
• Tongue: English
• Weight: 607 KB
• Volume: 100-101
• Category: Article
• ISSN: 0169-4332
• DOI: 10.1016/0169-4332(96)00313-3