Atomic structure of Si(111) surfaces
β Scribed by D.J. Chadi
- Publisher
- Elsevier Science
- Year
- 1980
- Weight
- 60 KB
- Volume
- 99
- Category
- Article
- ISSN
- 0167-2584
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π SIMILAR VOLUMES
The atomic structure of H-terminated Si( 111) surfaces is investigated by in-situ STM and electrochemical measurements in NH,F solutions of 2 < pH < 8. Etch rate measurements show only a slight pH-dependence between pH 2 and 14, when including alkaline solutions. Electrochemical results indicate tha
Ε½ . Ε½ . The changes of atomic structure and the coverage of binary metals Bi,Sb at the Si 111 surface induced by thermal Ε½ . Ε½ . annealing have been studied by means of low energy electron diffraction LEED , Auger electron spectroscopy AES , and Ε½ . Rutherford backscattering spectrometry RBS techniq