Atomic Layer Doping (ALD) technology in Si and its application to a new structure FET

✍ Scribed by Aart A. Van Gorkum; Kiyokazu Nakagawa; Yasuhiro Shiraki

• Book ID: 107790307
• Publisher: Elsevier Science
• Year: 1989
• Tongue: English
• Weight: 303 KB
• Volume: 95
• Category: Article
• ISSN: 0022-0248
• DOI: 10.1016/0022-0248(89)90447-8