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Atomic layer deposition of high-quality Al2O3 and Al-doped TiO2 thin films from hydrogen-free precursors

✍ Scribed by Aarik, Lauri; Arroval, Tõnis; Rammula, Raul; Mändar, Hugo; Sammelselg, Väino; Hudec, Boris; Hušeková, Kristína; Fröhlich, Karol; Aarik, Jaan

Book ID: 125800699
Publisher: Elsevier Science
Year: 2014
Tongue: English
Weight: 756 KB
Volume: 565
Category: Article
ISSN: 0040-6090
DOI: 10.1016/j.tsf.2014.06.038

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