✦ LIBER ✦
Atomic Layer Deposition of High-<tex>$kappa$</tex>Dielectric for Germanium MOS Applications—Substrate Surface Preparation
✍ Scribed by Chui, C.O.; Kim, H.; McIntyre, P.C.; Saraswat, K.C.
- Book ID
- 120396088
- Publisher
- IEEE
- Year
- 2004
- Tongue
- English
- Weight
- 159 KB
- Volume
- 25
- Category
- Article
- ISSN
- 0741-3106
No coin nor oath required. For personal study only.