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Atomic Layer Deposition of High-k Oxides of the Group 4 Metals for Memory Applications (Adv. Eng. Mater. 4/2009)

✍ Scribed by Jaakko Niinistö; Kaupo Kukli; Mikko Heikkilä; Mikko Ritala; Markku Leskelä

Book ID
102687195
Publisher
John Wiley and Sons
Year
2009
Tongue
English
Weight
502 KB
Volume
11
Category
Article
ISSN
1438-1656

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Atomic Layer Deposition of High-k Oxides
Atomic Layer Deposition of High-k Oxides of the Group 4 Metals for Memory Applications
✍ Jaakko Niinistö; Kaupo Kukli; Mikko Heikkilä; Mikko Ritala; Markku Leskelä 📂 Article 📅 2009 🏛 John Wiley and Sons 🌐 English ⚖ 995 KB

## Abstract This paper reviews several high‐k ALD processes potentially applicable to the production of capacitors, concentrating on very recent developments. A list of the dielectric materials under investigation consists of the oxides of several metals, including the Group 4 (Ti, Zr, Hf) elements