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Atomic Layer Deposition of Al 2 O 3 onto Sn-Doped In 2 O 3 : Absence of Self-Limited Adsorption during Initial Growth by Oxygen Diffusion from the Substrate and Band Offset Modification by Fermi Level Pinning in Al 2 O 3

✍ Scribed by Bayer, Thorsten J.M.; Wachau, André; Fuchs, Anne; Deuermeier, Jonas; Klein, Andreas


Book ID
125422939
Publisher
American Chemical Society
Year
2012
Tongue
English
Weight
774 KB
Volume
24
Category
Article
ISSN
0897-4756

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