Atomic Force Microscopy Investigation of Noble Gas Ion Bombardment on InP: Effect of Ion Energy
✍ Scribed by Demanet, C. M.; Vijaya Sankar, K.; Malherbe, J. B.; van der Berg, N. G.; Odendaal, R. Q.
- Publisher
- John Wiley and Sons
- Year
- 1996
- Tongue
- English
- Weight
- 648 KB
- Volume
- 24
- Category
- Article
- ISSN
- 0142-2421
No coin nor oath required. For personal study only.
✦ Synopsis
Mirror-polished InP(100) samples, ndoped with S atoms to 4 x lo'* cm-', were bombarded with neon, argon and krypton ions. The energy of the ions was varied from 05-5 keV at a constant angle of incidence at 41" with respect to the sample normal. The ion dose density for Ne' was 1.8 x 10l6 ions cm-' and for Ar+ and Kr+ was 5 x 1OI6 ions cm-'. A low ion current density of 5 x lo'' ions cm-' s: ' was used to minimize sample heating. The resulting topography development was investigated by atomic force microscopy (AFM). The topography development was quantified in terms of RMS (root-mean-square) roughness using the software of the AFM and analysed as a function of the energy of the bombarded ions. Atomic force micrographs showing various types of topography for some specific ion energies are presented. For each ion species there is a critical energy for which the surface roughness attains a maximum value.