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Atom-rearrangement in Ge layer grown on Si substrate during anneal observed in real time by coaxial impact collision ion scattering spectroscopy

✍ Scribed by T. Saitoh; M. Tamura; J.E. Palmer; T. Yodo


Publisher
Elsevier Science
Year
1995
Tongue
English
Weight
442 KB
Volume
150
Category
Article
ISSN
0022-0248

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