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Assessment of interface roughness during plasma etching through the use of real-time ellipsometry

✍ Scribed by Chien-Yuan Han; Chien-Wen Lai; Yu-Faye Chao; Ke-Ciang Leou; Tsang-Lang Lin

Book ID
103820367
Publisher
Elsevier Science
Year
2011
Tongue
English
Weight
510 KB
Volume
257
Category
Article
ISSN
0169-4332

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