Arsenic distribution in bilayers of TiSi2 on polycrystalline silicon during heat treatment

✍ Scribed by M. Östling; C.S. Petersson; C. Chatfield; H. Norström; F. Runovc; R. Buchta; P. Wiklund

• Publisher: Elsevier Science
• Year: 1983
• Tongue: English
• Weight: 431 KB
• Volume: 110
• Category: Article
• ISSN: 0040-6090
• DOI: 10.1016/0040-6090(83)90509-6