✦ LIBER ✦
Argon and reactive ion beam etching for SAW devices : R. E. Chapman. Vacuum34 (3–4), 417 (1984)
- Publisher
- Elsevier Science
- Year
- 1984
- Tongue
- English
- Weight
- 67 KB
- Volume
- 24
- Category
- Article
- ISSN
- 0026-2714
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