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Are Interface State Generation and Positive Oxide Charge Trapping Under Negative-Bias Temperature Stressing Correlated or Coupled?

✍ Scribed by Ho, T.J.J.; Ang, D.S.; Boo, A.A.; Teo, Z.Q.; Leong, K.C.


Book ID
114620899
Publisher
IEEE
Year
2012
Tongue
English
Weight
848 KB
Volume
59
Category
Article
ISSN
0018-9383

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