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Application of variable shaped electron beam technology to the development of 0.5 micron CMOS technology with extensions to 0.25 micron

✍ Scribed by P.J. Coane; P.J. Rudeck; T. Newman; A.D. Wilson; F.J. Hohn


Publisher
Elsevier Science
Year
1989
Tongue
English
Weight
450 KB
Volume
9
Category
Article
ISSN
0167-9317

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