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Application of two-dimensional process/device simulation for evaluating MOSFET fabrication processes

✍ Scribed by Satoshi Tazawa; Tadao Takeda; Kiyoyuki Yokoyama; Masaaki Tomizawa; Akira Yoshii

Publisher: Elsevier Science
Year: 1987
Tongue: English
Weight: 652 KB
Volume: 30
Category: Article
ISSN: 0038-1101
DOI: 10.1016/0038-1101(87)90165-1

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