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Application of selective CVD tungsten for low contact resistance via filling to aluminum multilayer interconnection

✍ Scribed by S. Rang; R. Chow; R. H. Wilson; B. Gorowitz; A. G. Williams


Book ID
112812315
Publisher
Springer US
Year
1988
Tongue
English
Weight
597 KB
Volume
17
Category
Article
ISSN
0361-5235

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