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Application of ion beam analysis for the control of the improvement of the oxidation resistance of TiAl at 900 °C in air by fluorine ion implantation and HF-treatment

✍ Scribed by H.-E. Zschau; M. Schütze; H. Baumann; K. Bethge


Publisher
Elsevier Science
Year
2005
Tongue
English
Weight
173 KB
Volume
240
Category
Article
ISSN
0168-583X

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