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Anti-reflection porous SiO2 thin film deposited using reactive high-power impulse magnetron sputtering at high working pressure for use in a-Si:H solar cells

✍ Scribed by Kim, Kyeonghun; Kim, Sungmin; An, Sehoon; Lee, Geun-Hyuk; Kim, Donghwan; Han, Seunghee


Book ID
126497684
Publisher
Elsevier Science
Year
2014
Tongue
English
Weight
540 KB
Volume
130
Category
Article
ISSN
0927-0248

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