๐”– Bobbio Scriptorium
โœฆ   LIBER   โœฆ

Anomalous phosphorous diffusion

โœ Scribed by Suzuki, K.; Tashiro, H.; Tada, Y.; Kataoka, Y.

Book ID
114616887
Publisher
IEEE
Year
2002
Tongue
English
Weight
339 KB
Volume
49
Category
Article
ISSN
0018-9383

No coin nor oath required. For personal study only.

๐Ÿ“œ SIMILAR VOLUMES

Anomalous Heat Diffusion
Anomalous Heat Diffusion
โœ Liu, Sha; Hรคnggi, Peter; Li, Nianbei; Ren, Jie; Li, Baowen ๐Ÿ“‚ Article ๐Ÿ“… 2014 ๐Ÿ› The American Physical Society ๐ŸŒ English โš– 225 KB
Implantation and diffusion of phosphorou
Implantation and diffusion of phosphorous in germanium
โœ A. Chroneos; D. Skarlatos; C. Tsamis; A. Christofi; D.S. McPhail; R. Hung ๐Ÿ“‚ Article ๐Ÿ“… 2006 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 190 KB

In this work, we investigate the implantation and diffusion of phosphorous (P) in germanium (Ge). Ge wafers were implanted at two different doses (5 ร‚ 10 13 and 10 15 cm ร€2 ) and a range of energies (30, 50 and 150 keV). Part of the wafers was covered with a 40 nm silicon dioxide (SiO 2 ) and an 80